1. An evaporation apparatus, comprising:

the crucible comprises a crucible body (1), wherein a plurality of accommodating grooves (11) for accommodating evaporation materials are formed in the crucible body (1), a heating groove (3) is formed between every two adjacent accommodating grooves (11), the heating groove (3) is arranged outside the crucible body (1), and heating elements (4) are arranged on the outer surfaces of the accommodating grooves (11) and the heating groove (3);

the crucible evaporation device comprises a cover plate (2), wherein the cover plate (2) is arranged on the crucible (1) in a covering mode, and a plurality of evaporation opening parts (211) used for ejecting evaporation materials are arranged on the cover plate (2).

2. A vapor deposition device according to claim 1, characterized in that the crucible (1) is further provided with a diffusion chamber (12) inside, and the diffusion chamber (12) is arranged between the receiving groove (11) and the cover plate (2).

3. A vapor deposition apparatus according to claim 2, wherein a partition plate (13) is further provided inside the crucible (1), the partition plate (13) is provided between the accommodating tank (11) and the diffusion chamber (12), and the partition plate (13) is uniformly provided with a plurality of first through holes (131) for communicating the accommodating tank (11) and the diffusion chamber (12).

4. The vapor deposition apparatus according to claim 1, wherein a plurality of partition parts (14) are provided inside the crucible (1), a plurality of second through holes (151) are provided in a bottom wall (15) of the crucible (1), and the partition parts (14) are provided on both sides of the second through holes (151) to form a plurality of the housing grooves (11) inside the crucible (1) and a plurality of the heating grooves (3) outside the crucible (1);

the isolation layer part (14) is arranged between every two adjacent accommodating grooves (11), and the heating groove (3) is formed in the isolation layer part (14).

5. The vapor deposition device according to claim 1, wherein the heating bath (3) is provided with a mounting portion (31) for fixing the heating member (4).

6. The vapor deposition device according to claim 1, wherein a cross-sectional area of the storage groove (11) in the horizontal direction (X) is gradually increased from bottom to top.

7. A vapor deposition apparatus according to any one of claims 1 to 6, characterized in that the top of the crucible (1) has a rectangular cross section along the horizontal direction (X), and the cover plate (2) has a rectangular cross section along the horizontal direction (X);

the crucible cover plate (2) is provided with a plurality of line sources (21) which are arranged in parallel with the length direction (L) of the crucible (1), each line source (21) is provided with a plurality of evaporation opening parts (211), and the evaporation opening parts (211) of each line source (21) are arranged in a zigzag mode along the length direction (L) of the crucible (1).

8. The vapor deposition device according to claim 7, wherein the evaporation port sections (211) adjacent to each other between the plurality of line sources (21) are arranged in a zigzag shape in a width direction (W) of the crucible (1).

Background

In the preparation process of the OLED panel, an evaporation process is a key process. In the coating by vaporization in-process, adopt the coating by vaporization mask to shelter from the substrate, coating by vaporization material from coating by vaporization mask opening coating by vaporization to the substrate that corresponds, but the mode that nevertheless adopts point source and line source usually at present, so need point source or line source and substrate to take place relative movement and just can make the substrate by the coating by vaporization to not only can lead to the decline of coating by vaporization efficiency, still can lead to evaporation oral area to influence each other at different positions spun coating by vaporization material because of point source or line source exist to remove, finally can lead to the shaping thickness of organic film inhomogeneous. That is, the conventional point source and line source have low vapor deposition efficiency and low vapor deposition quality.

Therefore, there is a need for a vapor deposition apparatus to solve the above problems.

Disclosure of Invention

The application provides an evaporation device to improve evaporation efficiency and evaporation quality.

The embodiment of the application provides an evaporation device, includes:

the crucible comprises a crucible body, wherein a plurality of accommodating grooves for accommodating evaporation materials are formed in the crucible body, a heating groove is formed between every two adjacent accommodating grooves and is arranged outside the crucible body, and heating elements are arranged on the outer surfaces of the accommodating grooves and the heating groove;

the cover plate is covered on the crucible and provided with a plurality of evaporation openings for spraying evaporation materials.

In a possible design, a diffusion cavity is further arranged inside the crucible and is arranged between the accommodating groove and the cover plate.

In a possible design, a partition plate is further arranged inside the crucible and arranged between the accommodating groove and the diffusion cavity, and a plurality of first through holes for communicating the accommodating groove and the diffusion cavity are uniformly formed in the partition plate.

In one possible design, the crucible is provided with a plurality of partition parts inside, the bottom wall of the crucible is provided with a plurality of second through holes, and the partition parts are arranged on two sides of the second through holes so as to form a plurality of accommodating grooves inside the crucible and a plurality of heating grooves outside the crucible;

the partition layer part is arranged between every two adjacent accommodating grooves, and the heating groove is formed in the partition layer part.

In one possible embodiment, the heating bath is provided with a mounting portion for fixing the heating element.

In a possible design, the cross-sectional area of the receiving groove in the horizontal direction gradually increases from bottom to top.

In one possible design, the top of the crucible is rectangular in cross section along the horizontal direction, and the cover plate is rectangular in cross section along the horizontal direction;

the cover plate is provided with a plurality of line sources which are arranged in parallel with the length direction of the crucible, each line source is provided with a plurality of evaporation opening parts, and the evaporation opening parts of each line source are arranged in a zigzag mode along the length direction of the crucible.

In one possible design, the evaporation port portions adjacent to each other between the plurality of line sources are arranged in a zigzag shape in the width direction of the crucible.

It is thus clear that the coating by vaporization device that this application provided sets up the heating bath through the outside at the crucible, and the heating bath sets up between two adjacent accepting grooves, and the surface of accepting groove and heating bath all are provided with the heating member, can improve the heating efficiency of coating by vaporization material in every accepting groove like this to can improve coating by vaporization efficiency and coating by vaporization quality.

Drawings

Fig. 1 is a front view of an evaporation apparatus provided in an embodiment of the present application;

fig. 2 is a top view of a cover plate provided in an embodiment of the present application;

FIG. 3 is a top view of a crucible provided in an embodiment of the present application;

FIG. 4 is a schematic cross-sectional view of the crucible of FIG. 3 taken along line A-A.

Reference numerals:

x-horizontal direction;

l-length direction;

w-width direction;

10-a substrate;

20-masking;

1-a crucible;

11-a holding tank;

12-a diffusion chamber;

13-a partition plate;

131-a first via;

14-a barrier portion;

15-a bottom wall;

151-second via;

2-cover plate;

a 21-line source;

211-evaporation orifice;

3-heating a tank;

31-a mounting portion;

4-heating element.

The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the present application and together with the description, serve to explain the principles of the application.

Detailed Description

The present application will be described in detail below with reference to the drawings and examples. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.

In the description of the embodiments of the present application, the terms "first", "second", and the like, unless expressly specified or limited otherwise, are used for descriptive purposes only and are not to be construed as indicating or implying relative importance; the term "plurality" means two or more unless specified or indicated otherwise; the terms "connected," "fixed," and the like are to be construed broadly and may, for example, be fixedly connected, detachably connected, integrally connected, or electrically connected; may be directly connected or indirectly connected through an intermediate. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.

In the description of the present application, it should be understood that the terms "upper" and "lower" used in the description of the embodiments of the present application are used in a descriptive sense only and not for purposes of limitation. In addition, in this context, it will also be understood that when an element is referred to as being "on" or "under" another element, it can be directly on "or" under "the other element or be indirectly on" or "under" the other element via an intermediate element.

As shown in fig. 1, it is a front view of an evaporation apparatus provided in an embodiment of the present application; as shown in fig. 2, which is a top view of the cover plate provided in the embodiment of the present application; as shown in fig. 3, which is a top view of a crucible provided in the embodiments of the present application. Referring to fig. 1 to 3, the evaporation apparatus includes a crucible 1 and a cover plate 2, wherein:

the crucible 1 is internally provided with a plurality of accommodating grooves 11 for accommodating evaporation materials, a heating groove 3 is arranged between two adjacent accommodating grooves 11, the heating groove 3 is arranged outside the crucible 1, and heating elements 4 are arranged on the outer surfaces of the accommodating grooves 11 and the heating groove 3; and a cover plate 2, wherein the cover plate 2 is arranged on the crucible 1 in a covering manner, and the cover plate 2 is provided with a plurality of evaporation port parts 211 for ejecting the evaporation material. The application provides a coating by vaporization device sets up heating tank 3 through the outside at crucible 1, and heating tank 3 sets up between two adjacent accepting grooves 11, and the surface of accepting groove 11 and heating tank 3 all are provided with the heating member, so can improve the heating efficiency of coating by vaporization material in every accepting groove 11 to can improve coating by vaporization efficiency and coating by vaporization quality. The vapor deposition material in the storage tank 11 is heated by the heating member 4 and then ejected upward, and the ejected vapor deposition material passes through the mask 20 to form an organic film on the substrate 10.

Referring to fig. 2, in some embodiments, the top of the crucible 1 has a rectangular cross section along the horizontal direction X, the cover plate 2 has a rectangular cross section along the horizontal direction X, and the cover plate 2 is provided with a plurality of line sources 21 arranged parallel to the length direction L of the crucible 1, that is, the evaporation apparatus provided by the present application is a surface source, and the surface source does not need to relatively move relative to the substrate 10 compared to the point sources or line sources, so that a desired organic film can be formed on the substrate 10 at one time. Each line source 21 is provided with a plurality of evaporation port parts 211, and the evaporation port parts 211 of each line source 21 are arranged in a zigzag shape along the length direction L of the crucible 1 (see the dotted lines in FIG. 2 arranged in a zigzag shape along the length direction L). The line source 21 is an imaginary structure, so the cover plate 2 is divided into three line sources 21 in a dotted line manner in fig. 2, which is only used for exemplary illustration. By arranging the evaporation port portions 211 of each line source 21 in a zigzag shape along the longitudinal direction L of the crucible 1, the occurrence of shadows in the gap between the substrate 10 and the mask 20 is reduced, and the uniformity of the thickness of the vapor deposition material formed is improved. To further enhance the effects of the above embodiments, in other embodiments, the evaporation port portions 211 adjacent to each other between the plurality of line sources 21 are arranged in a zigzag shape in the width direction W of the crucible 1 (see the dotted lines arranged in a zigzag shape in the width direction W in fig. 2).

As shown in fig. 4, which is a schematic sectional view of the crucible of fig. 3 taken along a-a. Referring to fig. 3 and 4, in some embodiments, the crucible 1 is further provided with a diffusion chamber 12 inside, and the diffusion chamber 12 is disposed between the receiving groove 11 and the cover plate 2. Through setting up diffusion chamber 12, can be so that the coating by vaporization material after the heating can obtain better evenly in diffusion chamber 12 to the homogeneity of coating by vaporization material shaping thickness has been improved.

In some embodiments, the partition plate 13 is further disposed inside the crucible 1, the partition plate 13 is disposed between the receiving groove 11 and the diffusion chamber 12, and the partition plate 13 is uniformly provided with a plurality of first through holes 131 for communicating the receiving groove 11 and the diffusion chamber 12. Through setting up division board 13, can be so that the coating by vaporization material after the heating realizes evenly for the first time when passing through division board 13 to provide the basis for realizing at the better even effect in diffusion chamber 12.

In some embodiments, the crucible 1 is provided with a plurality of partition parts 14 inside, the bottom wall 15 of the crucible 1 is provided with a plurality of second through holes 151, and the partition parts 14 are provided at both sides of the second through holes 151 to form a plurality of receiving grooves 11 inside the crucible 1 and a plurality of heating grooves 3 outside the crucible 1; a partition 14 is provided between two adjacent storage tanks 11, and the heating tank 3 is formed inside the partition 14. That is, the crucible 1 of the present embodiment is formed by separate assembly, and the partition part 14 may be made of the same material as or different from the crucible 1, so that the cost for forming the crucible 1 can be reduced. Of course, the crucible 1 may be formed integrally, that is, the barrier portion 14 may be made of the same material as the crucible 1.

In some embodiments, the heating bath 3 is provided with a mounting portion 31 for fixing the heating member 4, which facilitates the fixing by winding the heating member 4 around the mounting portion 31. For example, the mounting portion 31 may be a columnar protrusion, but may also be other structures capable of fixing the heating member 4, which will not be described herein.

In some embodiments, the sectional area of the receiving groove 11 along the horizontal direction X gradually increases from bottom to top, thereby facilitating evaporation of the evaporation material, reducing the island effect occurring in the crucible 1, and further ensuring the evaporation efficiency and the evaporation quality of the evaporation device.

In conclusion, the evaporation device provided by the application is provided with the heating groove 3 through the outside of the crucible 1, the heating groove 3 is arranged between the two adjacent accommodating grooves 11, and the outer surfaces of the accommodating grooves 11 and the heating groove 3 are both provided with heating members, so that the heating efficiency of the evaporation material in each accommodating groove 11 can be improved, and the evaporation efficiency and the evaporation quality can be improved.

The above description is only exemplary of the present application and should not be taken as limiting the present application, as any modification, equivalent replacement, or improvement made within the spirit and principle of the present application should be included in the scope of protection of the present application.