Evaporation plating device

文档序号:3587 发布日期:2021-09-17 浏览:64次 中文

1. An evaporation apparatus, comprising:

the crucible (1) is used for accommodating evaporation materials, and the top opening of the crucible (1) is circular in section along the horizontal direction (X);

the cover plate (2) is arranged on the crucible (1) in a covering mode, the cross section of the cover plate (2) along the horizontal direction (X) is circular, and a first area (21), a second area (22) and a third area (23) are sequentially arranged on the cover plate (2) along the radial direction from inside to outside;

the first area (21) is provided with a first evaporation opening part (211) which is concentric with the cover plate (2);

the second area (22) is provided with at least three circles of second evaporation opening parts (221) which are distributed at equal intervals, the distance from the circle center of the second evaporation opening part (221) in each circle to the circle center of the cover plate (2) is equal, the distance between two adjacent second evaporation opening parts (221) in each circle is equal, and the connecting lines from the circle centers of the second evaporation opening parts (221) in two adjacent circles to the circle center of the cover plate (2) are not overlapped;

the third area (23) is provided with at least one circle of third evaporation opening parts (231) distributed at equal intervals, the distance from the circle center of the third evaporation opening part (231) in each circle to the circle center of the cover plate (2) is equal, and the interval between every two adjacent third evaporation opening parts (231) in each circle is equal.

2. The vapor deposition device according to claim 1, wherein the cover plate (2) further comprises a fourth region (24) located outside the third region (23), the fourth region (24) is provided with at least one circle of a plurality of fourth evaporation port portions (241) distributed at equal intervals, the distance from the center of the circle of the fourth evaporation port portion (241) to the center of the cover plate (2) in each circle is equal, and the distance between two adjacent fourth evaporation port portions (241) in each circle is equal;

the diameter of the fourth evaporation port portion (241) is smaller than half of the diameter of the third evaporation port portion, and the pitch between two adjacent fourth evaporation port portions (241) in each turn is smaller than half of the pitch between two adjacent third evaporation port portions (231) in each turn.

3. The vapor deposition device according to claim 2, wherein the first evaporation port portion (211) is located at a central axis of the cover plate (2) and perpendicular to the cover plate (2), the second evaporation port portion (221) is disposed to be inclined toward the central axis of the cover plate (2), and the third evaporation port portion (231) and the fourth evaporation port portion (241) are both disposed to be inclined away from the central axis of the cover plate (2).

4. A vapor deposition device according to claim 3, wherein the outlet cross section of the second evaporation port portion (221) has a first angle (a) with the horizontal direction (X), and the outlet cross sections of the third evaporation port portion (231) and the fourth evaporation port portion (241) have a second angle (b) with the horizontal direction (X).

5. The vapor deposition apparatus according to claim 4, wherein the first included angle (a) is 30 to 50 degrees, and the second included angle (b) is 40 to 60 degrees.

6. The vapor deposition device according to claim 2, wherein the first evaporation port portion (211) is located at a central axis of the cover plate (2) and is perpendicular to the cover plate (2), and the second evaporation port portion (221), the third evaporation port portion (231), and the fourth evaporation port portion (241) are perpendicular to the cover plate (2).

7. The vapor deposition device according to claim 6, wherein the outlet cross-sections of the second evaporation port portion (221), the third evaporation port portion (231), and the fourth evaporation port portion (241) form an angle with a horizontal direction (X).

8. The vapor deposition device according to claim 1, wherein an inner diameter of the first evaporation port portion (211) gradually increases in a direction in which the vapor deposition material is ejected.

9. The vapor deposition device according to claim 1, wherein inner diameters of the second evaporation port portion (221) and the third evaporation port portion (231) are gradually reduced in a direction in which the vapor deposition material is ejected.

10. A vapor deposition device according to any of claims 1-9, characterized in that the crucible (1) is provided with a positioning groove (11) at the top, the cover plate (2) is provided with a positioning protrusion (25), and the cover plate (2) is fixed with the crucible (1) by the positioning protrusion (25) matching with the positioning groove (11).

Background

In the preparation process of the OLED panel, an evaporation process is a key process. In the coating by vaporization in-process, adopt the coating by vaporization mask to shelter from the substrate, coating by vaporization material from the coating by vaporization mask opening coating by vaporization to the substrate position that corresponds, nevertheless because the mode that adopts point source and line source, can produce relative motion between evaporation source and the substrate at present to lead to the coating by vaporization shadow region can appear in the clearance between mask and the substrate, if the shadow region is too big, can lead to the colour mixture and the colour cast problem of pixel.

Therefore, there is a need for a vapor deposition apparatus to solve the above problems.

Disclosure of Invention

The application provides an evaporation device to reduce the shadow region of coating by vaporization, and improve the homogeneity of coating by vaporization material shaping thickness.

The embodiment of the application provides an evaporation device, includes:

the crucible is used for accommodating evaporation materials, and the top opening of the crucible is circular in section along the horizontal direction;

the cover plate is covered on the crucible, the cross section of the cover plate along the horizontal direction is circular, and the cover plate is provided with a first area, a second area and a third area along the radial direction from inside to outside in sequence;

the first area is provided with a first evaporation opening part which is concentric with the cover plate;

the second area is provided with at least three circles of second evaporation port parts which are distributed at equal intervals, the distance from the circle center of the second evaporation port part in each circle to the circle center of the cover plate is equal, the distance between every two adjacent second evaporation port parts in each circle is equal, and the connecting line between the circle centers of the second evaporation port parts in every two adjacent circles and the circle center of the cover plate is not overlapped;

the third area is provided with at least one circle of a plurality of third evaporation opening parts distributed at equal intervals, the distance from the circle center of the third evaporation opening part in each circle to the circle center of the cover plate is equal, and the interval between every two adjacent third evaporation opening parts in each circle is equal.

In a possible design, the cover plate further includes a fourth region located outside the third region, the fourth region is provided with at least one circle of a plurality of fourth evaporation port portions distributed at equal intervals, the distance from the center of the fourth evaporation port portion in each circle to the center of the cover plate is equal, and the interval between two adjacent fourth evaporation port portions in each circle is equal;

the diameter of the fourth evaporation port part is smaller than half of the diameter of the third evaporation port part, and the distance between every two adjacent fourth evaporation port parts in each circle is smaller than half of the distance between every two adjacent third evaporation port parts in each circle.

In a possible design, the first evaporation port is located the axis of the cover plate and perpendicular to the cover plate, the second evaporation port faces the axis of the cover plate, and the third evaporation port and the fourth evaporation port are both away from the axis of the cover plate.

In a possible design, the outlet cross section of the second evaporation port has a first angle with the horizontal direction, and the outlet cross sections of the third evaporation port and the fourth evaporation port have a second angle with the horizontal direction.

In one possible design, the first included angle is 30-50 degrees and the second included angle is 40-60 degrees.

In one possible design, the first evaporation port is located on a central axis of the cover plate and perpendicular to the cover plate, and the second evaporation port, the third evaporation port and the fourth evaporation port are perpendicular to the cover plate.

In a possible design, the outlet cross-sections of the second, third and fourth evaporation mouth portions have an angle to the horizontal.

In one possible design, an inner diameter of the first evaporation port portion gradually increases in a direction in which the evaporation material is ejected.

In one possible design, the inner diameters of the second evaporation port portion and the third evaporation port portion gradually decrease in a direction in which the evaporation material is ejected.

In one possible design, the top of the crucible is provided with a positioning groove, the cover plate is provided with a positioning bulge, and the cover plate is fixed with the crucible through the matching of the positioning bulge and the positioning groove.

Therefore, the evaporation device provided by the application is provided with the first area, the second area and the third area along the radial direction of the cover plate from inside to outside in sequence; the first area is provided with a first evaporation opening part which is concentric with the cover plate; the second area is provided with at least three circles of second evaporation port parts which are distributed at equal intervals, the distance from the circle center of the second evaporation port part in each circle to the circle center of the cover plate is equal, the distance between two adjacent second evaporation port parts in each circle is equal, and the connecting line between the circle centers of the second evaporation port parts in two adjacent circles and the circle center of the cover plate is not overlapped; the third area is provided with a plurality of third evaporation mouth parts that at least a circle equidistant distribution, and the distance that the centre of a circle of third evaporation mouth part in every circle equals to the centre of a circle of apron, and the interval of two adjacent third evaporation mouth parts in every circle equals, so the setting can reduce the shadow region of coating by vaporization effectively to improve the homogeneity of coating by vaporization material shaping thickness.

Drawings

Fig. 1 is a front view of an evaporation apparatus provided in an embodiment of the present application;

fig. 2 is a top view of an evaporation apparatus provided in an embodiment of the present application;

FIG. 3 is a schematic sectional view of a first evaporation port provided in an embodiment of the present application;

FIG. 4 is a schematic cross-sectional view of a second evaporation port provided in an embodiment of the present application;

FIG. 5 is a schematic cross-sectional view of a third evaporation port provided in an embodiment of the present application;

FIG. 6 is a front view of a first evaporation port, a second evaporation port, a third evaporation port and a fourth evaporation port provided in accordance with still another embodiment of the present application;

FIG. 7 is a front view of a first evaporation port, a second evaporation port, a third evaporation port and a fourth evaporation port provided in accordance with still another embodiment of the present application.

Reference numerals:

x-horizontal direction;

a-a first included angle;

b-a second included angle;

10-a substrate;

20-masking;

1-a crucible;

11-a positioning groove;

2-cover plate;

21-a first region;

211-a first evaporation orifice;

22-a second region;

221-a second evaporation mouth;

23-a third region;

231-a third evaporation port;

24-a fourth region;

241-a fourth evaporation orifice;

25-positioning projection.

The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the present application and together with the description, serve to explain the principles of the application.

Detailed Description

The present application will be described in detail below with reference to the drawings and examples. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.

In the description of the embodiments of the present application, the terms "first", "second", and the like, unless expressly specified or limited otherwise, are used for descriptive purposes only and are not to be construed as indicating or implying relative importance; the term "plurality" means two or more unless specified or indicated otherwise; the terms "connected," "fixed," and the like are to be construed broadly and may, for example, be fixedly connected, detachably connected, integrally connected, or electrically connected; may be directly connected or indirectly connected through an intermediate. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.

In the description of the present application, it should be understood that the terms "upper" and "lower" used in the description of the embodiments of the present application are used in a descriptive sense only and not for purposes of limitation. In addition, in this context, it will also be understood that when an element is referred to as being "on" or "under" another element, it can be directly on "or" under "the other element or be indirectly on" or "under" the other element via an intermediate element.

As shown in fig. 1 and fig. 2, which are a front view and a top view of an evaporation apparatus provided in an embodiment of the present application, respectively. This coating by vaporization device includes crucible 1 and apron 2, wherein:

the crucible 1 is used for accommodating evaporation materials, and the top opening of the crucible 1 has a circular section along the horizontal direction X; the cover plate 2 is covered on the top opening of the crucible 1, the cross section of the cover plate 2 along the horizontal direction X is circular, and the cover plate 2 is provided with a first area 21, a second area 22 and a third area 23 along the radial direction from inside to outside in sequence; the first area 21 is provided with a first evaporation port 211 concentric with the cover plate 2; the second area 22 is provided with at least three circles of second evaporation port parts 221 which are distributed at equal intervals, the distance from the center of the second evaporation port part 221 in each circle to the center of the cover plate 2 is equal, the distance between two adjacent second evaporation port parts 221 in each circle is equal, and the connecting lines from the centers of the second evaporation port parts 221 in two adjacent circles to the center of the cover plate 2 are not overlapped; the third region 23 is provided with at least one circle of a plurality of third evaporation port parts 231 distributed at equal intervals, the distance from the center of the third evaporation port part 231 in each circle to the center of the cover plate 2 is equal, and the distance between two adjacent third evaporation port part 231 in each circle is equal. So set up, reduced the emergence of shadow region on the one hand, on the other hand improves the homogeneity of coating by vaporization material shaping thickness.

In some embodiments, the cover plate 2 further includes a fourth region 24 located outside the third region 23, the fourth region 24 is provided with at least one circle of a plurality of equally spaced fourth evaporation port portions 241, the distance from the center of the circle of the fourth evaporation port portion 241 to the center of the cover plate 2 is equal, and the distance between two adjacent fourth evaporation port portions 241 in each circle is equal; the diameter of the fourth evaporation port portion 241 is smaller than half of the diameter of the three evaporation port portions, and the pitch between two adjacent fourth evaporation port portions 241 in each turn is smaller than half of the pitch between two adjacent third evaporation port portions 231 in each turn. This is so arranged that an organic film having a uniform thickness is formed on the substrate 10 after the evaporation material passes through the mask 20, i.e., the evaporation material may be an organic material.

In some embodiments, the first evaporation port portion 211 is located on the central axis of the cover plate 2 and perpendicular to the cover plate 2, the second evaporation port portion 221 is disposed obliquely toward the central axis of the cover plate 2, and the third evaporation port portion 231 and the fourth evaporation port portion 241 are disposed obliquely away from the central axis of the cover plate 2. This is provided to make the molding thickness of the organic material evaporated on the substrate 10 more uniform, and at the same time, to reduce the occurrence of the shadow region.

Referring to fig. 4 and 5, the outlet section of the second evaporation port 221 has a first angle a with the horizontal direction X, and the outlet sections of the third evaporation port 231 and the fourth evaporation port 241 have a second angle b with the horizontal direction X. In some implementations, the first included angle a is 30-50 degrees and the second included angle b is 40-60 degrees. This is provided to further uniform the thickness of the organic material deposited on the substrate 10 and to reduce the occurrence of the shadow region.

In other embodiments, as shown in fig. 6 and 7, the first evaporation port portion 211 is located on the central axis of the cover plate 2 and is perpendicular to the cover plate 2, and the second evaporation port portion 221, the third evaporation port portion 231, and the fourth evaporation port portion 241 are perpendicular to the cover plate 2. This also makes it possible to form the organic material deposited on the substrate 10 with a more uniform thickness and to reduce the occurrence of shadow areas. However, the effect of this embodiment is slightly inferior to that of the embodiment shown in fig. 4 and 5.

Referring to fig. 6, the exit cross-sections of the second evaporation port 221, the third evaporation port 231 and the fourth evaporation port 241 form an included angle with the horizontal direction X. This is provided to further uniform the thickness of the organic material deposited on the substrate 10 and to reduce the occurrence of the shadow region. Of course, the outlet cross-sections of the second evaporation port portion 221, the third evaporation port portion 231, and the fourth evaporation port portion 241 may be parallel to the horizontal direction X.

In some embodiments, the inner diameter of the first evaporation port portion 211 gradually increases along the direction in which the evaporation material is ejected (see the arrow direction in fig. 3). With this arrangement, the uniformity of the thickness of the vapor deposition material formed at the center of the base material 10 can be improved.

In some embodiments, the inner diameters of the second evaporation port portion 221 and the third evaporation port portion 231 are gradually reduced in the direction in which the evaporation material is ejected (see the arrow direction in fig. 4 and 5). With this arrangement, the mutual influence of the vapor deposition materials ejected from the adjacent second evaporation port portion 221 and the third evaporation port portion 231 can be reduced, so that the thickness of the organic film formed on the substrate 10 can be more uniform. In addition, the inner diameter of the fourth evaporation port portion 241 may be gradually increased along the direction in which the evaporation material is ejected, so that the mutual influence of the evaporation materials ejected from the adjacent second evaporation port portion 221 and fourth evaporation port portion 241 can be reduced, and the forming thickness of the organic film on the substrate 10 can be more uniform.

In some embodiments, please continue to refer to fig. 2, the positioning groove 11 is disposed at the top of the crucible 1, the cover plate 2 is disposed with the positioning protrusion 25, and the cover plate 2 is fixed to the crucible 1 through the cooperation between the positioning protrusion 25 and the positioning groove 11, so as to increase the stability of fixing the cover plate 2 and improve the effect of easy detachment of the cover plate 2.

In summary, the evaporation apparatus provided in the embodiment of the present application is provided with the first evaporation port 211 concentric with the cover plate 2 in the first region 21; the second area 22 is provided with at least three circles of second evaporation port parts 221 which are distributed at equal intervals, the distance from the center of the second evaporation port part 221 in each circle to the center of the cover plate 2 is equal, the distance between two adjacent second evaporation port parts 221 in each circle is equal, and the connecting lines from the centers of the second evaporation port parts 221 in two adjacent circles to the center of the cover plate 2 are not overlapped; the third region 23 is provided with at least one circle of a plurality of third evaporation port parts 231 distributed at equal intervals, the distance from the center of the third evaporation port part 231 in each circle to the center of the cover plate 2 is equal, and the distance between two adjacent third evaporation port part 231 in each circle is equal. So set up, reduced the emergence of shadow region on the one hand, on the other hand improves the homogeneity of coating by vaporization material shaping thickness.

The above description is only exemplary of the present application and should not be taken as limiting the present application, as any modification, equivalent replacement, or improvement made within the spirit and principle of the present application should be included in the scope of protection of the present application.

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