1. The novel cathode target and the rotary air inlet method comprise a hollow air inlet cathode and a movable magnet, and are characterized in that: a rotary air inlet (104) is arranged in the middle of the pole target (101), a rotary air inlet (103) is also arranged on a circular sleeve (106) of the fixed flange (102), and the rotary air inlet design is favorable for the rotation of an arc root and the generation of a glow plasma arc state; the back of the cathode target (101) is provided with a radial magnet, the outer side of the target is provided with a magnet which can move back and forth, and the moving magnet can also be used for regulating and controlling the glow state of plasma electric arc to realize the uniform etching of the target material, so that the surface of a film-coated workpiece can obtain a smoother, more compact and high-quality film-coated film layer.

2. The novel cathode target and rotary air intake method according to claim 1, characterized in that: a pressing fixing cap (105) is arranged in the middle of the cathode target (107), a plurality of rotary air inlet holes (104) are arranged on the side surface of the fixing cap, and the material of the fixing cap is the same as that of the cathode.

3. The novel cathode target and rotary air intake method according to claim 1, characterized in that: a rotary air inlet hole (103) is also formed in the circular sleeve (106) of the fixed flange (102), and the rotary air inlet direction is the same as the air inlet direction on the cathode fixed cap (105).

4. The novel cathode target and rotary air intake method according to claim 1, characterized in that: the sealing ring of the fixed flange is 108 and is fixed with the vacuum shell (100) through uniformly distributed fixed screws (109), and working gas is introduced through the gas inlet pipe (101).

5. The novel cathode target and rotary air intake method according to claim 1, characterized in that: the cathode target (107) is insulated from the anode of the shell (100) through an insulating material (110), a cooling plate (113) is arranged on the back surface of the cathode, a magnetic field coil (111) is arranged in the cooling plate (113), and the magnetic field coil (111) is combined with a ferromagnetic material on the side surface of the cooling plate to establish a radial magnetic field on the target surface.

6. The novel cathode target and rotary air intake method according to claim 1, characterized in that: the outside of the cathode target (107) is provided with a dynamic magnet which can move back and forth, the magnet is composed of a magnetic field coil (111), and the magnetic field coil is driven by a linear motor (114) to move back and forth on a linear track (115).

7. The novel cathode target and rotary air intake method according to claim 1, characterized in that: the cooling plate (113) is made of metal heat conduction material, the side surface and the bottom of the cooling plate are made of ferromagnetic material (116), and a cooling circulating water inlet and outlet (112) is arranged in the cooling plate.

8. The novel cathode target and rotary air intake method according to claim 1, characterized in that: a DC arc power supply (117) is provided between the cathode target (107) and the housing (100).

Background

The gas inlet layout of the existing arc cathode device is generally designed by adopting a porous gas inlet design for opening holes from the side surface of equipment or the upper part of a box body, and the gas distribution of the gas inlet layout is difficult to be consistent for cathode targets at different positions, so that different plasma distributions and different arc etching rates are brought.

At present, the target of the arc cathode device is in a solid disc form, and a certain thickness is remained in the middle position after use, so that target waste is caused.

At present, the external magnetic field control of the arc cathode device adopts a fixed form, and the regulation is carried out without back and forth movement, which is not beneficial to the regulation of the plasma arc root state.

In view of the current situation of the cathode target, the rotary air inlet is arranged in the middle of the designed cathode target, and the rotary air inlet is also arranged on the inner side of the side cylinder, so that the rapid rotation of the plasma root of each cathode target can be ensured, the consistency of the gas state of each target area is ensured by adjusting the air inflow, and the consistency of the arc glow state and the etching amount of the plasma is ensured. In addition, the axial magnetic field change of the target is adjusted by adjusting the movement of the side magnets, the plasma arc glow state and radial movement are also favorably adjusted, and the uniform arc etching of the target is realized, so that the surface of a coated workpiece is provided with a smoother, more compact and high-quality coated film layer.

Disclosure of Invention

The novel cathode target and the rotary air inlet method are characterized in that the cathode target is provided with an air inlet (104) in the middle, a fixing cap (105) is arranged in the middle of the cathode target (107), the fixing cap is used for tightly pressing and fixing a cathode target material, and a plurality of rotary air inlets (104) are arranged on the side surface of the fixing cap to promote the plasma arc root to rotate; the material of the fixing cap is the same as that of the cathode material, so that the consistency with the coating material of the arc target material is ensured even if metal particles are sputtered on the middle fixing cap; another advantage of the hollow cathode target (107) is target material savings and improved target utilization.

The novel cathode target and the rotary air inlet method are characterized in that: the circular sleeve (106) of the fixed flange (102) is also provided with rotary air inlet holes (103), and the air inlet direction of the rotary air inlet holes is consistent with the flow direction of the air outlet holes of the cathode target fixing cap (105). The rotary air inlet design is beneficial to the rapid rotation of an arc root in the arc sputtering process and is also beneficial to generating a more uniform plasma arc discharge state.

The novel magnetron sputtering cathode target and the rotary air inlet method are characterized in that: the outside of the cathode target (107) is provided with a dynamic magnetic field coil (111) which can move back and forth, and the magnetic field coil is driven by a linear motor (114) to move back and forth on a linear track (115). The plasma state is regulated and controlled by the magnetic field change, the radial movement of the arc root is promoted, and the uniform etching of the target material is realized, so that the surface of a film-coated workpiece is a bright, clean and compact high-quality film-coated film layer.

The novel magnetron sputtering cathode target and the rotary air inlet method are characterized in that: the flange (102) is fixed with the vacuum shell (100) through uniformly distributed fixing screws (109), the vacuum is sealed through a sealing ring (108), and the gas inlet pipe (101) introduces discharge gas of plasma. The cathode target (107) is insulated from the anode of the shell (100) by an insulating material (110), a water cooling plate (113) is arranged on the back surface of the cathode, and a magnetic field coil (111) is arranged on the back surface of the cooling plate to establish a radial magnetic field of the target surface.

The novel magnetron sputtering cathode target and the rotary air inlet method are characterized in that: a cooling water inlet and outlet (112) and a middle air inlet pipe (101) are arranged on the cooling plate (116); a DC arc power supply (117) is provided between the cathode target (107) and the casing (100) for generating a plasma discharge of arc sputtering.

The invention is further described below with reference to the accompanying drawings.

Fig. 1 is a schematic structural view of a novel cathode target and a rotary air intake method according to an embodiment of the invention.

Fig. 2 is a schematic view of a rotary air intake structure of the novel cathode target and the rotary air intake method according to the embodiment of the invention.

Detailed Description

Referring to the attached fig. 1 and fig. 2, a new cathode target and the rotary air intake method, it is a cathode target (107) with air intake channel in the middle, there is a fixed cap (105) in the middle of its target, the fixed cap is a compressed cathode target, there are multiple rotary air intakes (104) in the side of the fixed cap, the material of the fixed cap and cathode material are the same material; a rotary air inlet hole (103) is also formed in the circular sleeve (106) of the fixed flange (102), and the rotary air inlet is consistent with the rotary air inlet of the fixed cap (105), so that the plasma arc on the surface of the cathode target is promoted to rotate more quickly, and a more uniform plasma arc etching target surface is generated. The glow characteristics of the plasma arc near the target are improved by controlling the gas flow rate.

Referring to fig. 1, a dynamic magnetic field coil (111) which can move back and forth is provided on the outer side of the cathode target (107), and the magnetic field coil is moved back and forth on a linear rail (115) by a linear motor (114). The plasma arc state is regulated and controlled by the movement of the magnetic field, the arc is promoted to move radially, and the uniform etching of the target material is realized, so that the surface of a film-coated workpiece is a bright, clean and compact high-quality film-coated film layer.

Referring to fig. 1, a sealing ring 108 for fixing a flange 102 is made of a silica gel material, the flange 102 is fixed with a vacuum casing 100 through uniformly distributed fixing screws 109, and an air inlet pipe 101 is provided. The cathode target (107) is insulated from the anode of the shell (100) through an insulating material (110), a water cooling plate (113) is arranged on the back of the cathode, a magnetic material (116) is arranged on the side surface of the cooling plate, an inlet and an outlet (112) of cooling water are arranged, an air inlet pipe (101) is arranged in the middle of the cathode, magnetic fields (111) are arranged on two sides of the air inlet pipe, and the magnetic fields generate radial magnetic fields on the surface of the target; a DC arc power supply (117) is provided between the cathode target (107) and the casing (100) for generating a plasma discharge of arc sputtering.

Referring to fig. 1, the housing (100) and the flange (102) are made of stainless steel, the insulating material (110) can be made of plastic or ceramic material, the water cooling plate (113) is made of metal heat conducting material, the side surface body (116) is made of ferromagnetic material, the air inlet pipe (101) is made of plastic or stainless steel pipe, and the cathode target (107) can be made of different metals or alloys according to the coating material requirement. The magnetic field coil (111) is made of copper material, and the power supply (117) adopts a direct current power supply.

The invention has been described above with reference to specific embodiments with reference to the accompanying drawings, however, it should be noted that many changes and modifications can be made to the above-described embodiments without departing from the spirit and scope of the invention, and these changes and modifications fall within the scope of the invention defined by the claims.