1. The utility model provides a semiconductor wafer is with cutting steel wire surface treatment device, includes the device body (1), hot-blast fan (7), mount (14), extension board (20), collecting box (27) and third hydraulic telescoping rod (28), its characterized in that:

the brush roll (2) is rotatably connected to the inner portion, close to the left side, of the device body (1), the upper end of the brush roll (2) penetrates through the device body (1) and is connected with a first rotating shaft (3), meanwhile, the left and right first rotating shafts (3) are connected through a toothed belt (4), the front and rear first rotating shafts (3) on the right side are meshed and connected through first gears (5), the first gears (5) penetrate through the first rotating shafts (3), and meanwhile, the first rotating shaft (3) on the right rear side is connected with a first motor (6);

the hot air fan (7) is arranged on the inner wall of the device body (1), the arrangement frame (8) is arranged on the right side of the device body (1), the support frame (9) is arranged on the right side of the arrangement frame (8), the inner wall of the support frame (9) is rotatably connected with a first lead screw (10), the rear end of the first lead screw (10) penetrates through the support frame (9) to be connected with a second rotating shaft (11), the second rotating shaft (11) is connected with a second motor (13) through a bevel gear set (12), and meanwhile the second motor (13) is arranged on the rear side of the support frame (9);

the fixing frame (14) penetrates through the first screw rod (10), a clamping shaft (15) penetrates through the fixing frame (14), meanwhile, the inner end of the clamping shaft (15) is connected with a winding roller (16) in a clamping mode, the clamping shaft (15) on the rear side is connected with a third rotating shaft (18) through a second gear (17), the second gear (17) penetrates through the clamping shaft (15) on the third rotating shaft (18) and the rear side respectively, the third rotating shaft (18) is connected with a third motor (19), and the third motor (19) penetrates through the fixing frame (14) on the rear side.

2. The surface treatment apparatus for a wire for dicing of a semiconductor wafer according to claim 1, wherein: the device body (1) comprises a cleaning cavity (101), a pickling cavity (102), a heating cavity (103), a first filter screen layer (104), a second filter screen layer (105), a cleaning roller (106), a guide roller (107), a first spray pipe (108), a second spray pipe (109) and a wiping roller (110), wherein the cleaning cavity (101), the pickling cavity (102) and the heating cavity (103) are arranged in the device body (1), the cleaning cavity (101) is arranged on the left side of the pickling cavity (102), the pickling cavity (102) is arranged on the left side of the heating cavity (103), the heating cavity (103) is arranged on the left side of a hot air fan (7), the cleaning roller (106) is rotatably connected to the inner wall of the heating cavity (103), the first filter screen layer (104) is arranged on the inner wall of the cleaning cavity (101), a first infusion pump is arranged in the cleaning cavity (101), and the first infusion pump is connected with the first spray pipe (108), pickling chamber (102) inner wall is provided with second filter screen layer (105), and is provided with the second transfer pump in pickling chamber (102), and the second transfer pump is connected with second spray tube (109) simultaneously, guide roll (107) rotate to be connected on device body (1) inner wall, and the top rotates in the device body (1) and is connected with wiping roller (110), wiping roller (110) are provided with two sets ofly, and every wiping roller (110) of group is provided with two, and every wiping roller of group (110) is corresponding with washing chamber (101) and pickling chamber (102) respectively simultaneously.

3. The surface treatment apparatus for a wire for dicing of a semiconductor wafer according to claim 1, wherein: the rotating mechanism is composed of the brush rolls (2), the first rotating shaft (3), the toothed belt (4), the first gear (5) and the first motor (6), the brush rolls (2) are arranged in two groups, and meanwhile the two groups of brush rolls (2) are symmetrically arranged relative to the central line of the device body (1).

4. The surface treatment apparatus for a wire for dicing of a semiconductor wafer according to claim 1, wherein: the collecting box (27) comprises a fan (2701) and a suction pipe (2702), the collecting box (27) is arranged in the device body (1), the collecting box (27) is arranged below the brush roller (2), the fan (2701) is arranged at the upper end of the collecting box (27), the fan (2701) is connected with the suction pipe (2702), and one end, far away from the fan (2701), of the suction pipe (2702) is arranged on the outer side of the brush roller (2).

5. The surface treatment apparatus for a wire for dicing of a semiconductor wafer according to claim 1, wherein: arrangement frame (8) including second lead screw (801), fourth motor (802), remove frame (803), spacing (804), supporting wheel (805) and spacing round (806), and arrangement frame (8) lateral wall rotates and is connected with second lead screw (801), second lead screw (801) rear end is run through arrangement frame (8) lateral wall and is connected with fourth motor (802), and runs through on second lead screw (801) and be provided with removal frame (803), it is provided with spacing (804) to remove frame (803) upper end, and spacing (804) lateral wall rotates and is connected with supporting wheel (805) and spacing round (806), and supporting wheel (805) set up between spacing round (806) simultaneously.

6. The surface treatment apparatus for a wire for dicing of a semiconductor wafer according to claim 1, wherein: the first lead screw (10), the second rotating shaft (11), the bevel gear set (12) and the second motor (13) form a rotating mechanism, two sections of reverse threads are arranged on the first lead screw (10), and two fixing frames (14) are symmetrically arranged on the first lead screw (10).

7. The surface treatment apparatus for a wire for dicing of a semiconductor wafer according to claim 1, wherein: the support plates (20) are arranged on the support frames (9), the support plates (20) are arranged between the fixing frames (14), the number of the support plates (20) is two, and the support plates (20) are symmetrically arranged relative to the center line of the support frames (9).

8. The surface treatment apparatus for a wire for dicing of a semiconductor wafer according to claim 1, wherein: the support plate (20) upper end contacts with first gyro wheel (21), and first gyro wheel (21) set up at first hydraulic telescoping rod (22) lower extreme, set up in frame (23) is run through to first hydraulic telescoping rod (22) upper end, and frame (23) lower terminal surface is close to the right side and is provided with second gyro wheel (24), be provided with second hydraulic telescoping rod (25) in frame (23), and second hydraulic telescoping rod (25) set up the right side at first hydraulic telescoping rod (22), second hydraulic telescoping rod (25) upper end is connected with roof-rack (26), and second hydraulic telescoping rod (25) and roof-rack (26) constitute telescopic machanism, and second hydraulic telescoping rod (25) set up about roof-rack (26) central line symmetry simultaneously.

9. The surface treatment apparatus for a wire for dicing of a semiconductor wafer according to claim 1, wherein: the device is characterized in that the third hydraulic telescopic rod (28) is arranged in the device body (1), the inner end of the third hydraulic telescopic rod (28) is connected with the U-shaped frame (29), meanwhile, the inner wall of the U-shaped frame (29) is rotatably connected with the pressing roller (30), the third hydraulic telescopic rod (28) and the U-shaped frame (29) form a rotating mechanism, and the U-shaped frame (29) is provided with two groups.

Background

Wafer refers to a silicon wafer used for making silicon semiconductor circuits, the starting material of which is silicon. And dissolving the high-purity polycrystalline silicon, doping the dissolved high-purity polycrystalline silicon into silicon crystal seed crystals, and slowly pulling out the silicon crystal seed crystals to form cylindrical monocrystalline silicon. The silicon crystal bar is ground, polished and sliced to form a silicon crystal wafer, the wafer needs to be cut and sliced in the production and processing process, the wafer is cut into slices, the general wafer cutting and slicing mode comprises laser cutting, traditional knife saw blade or grinding wheel blade cutting and cutting steel wire cutting, the cutting steel wire is named as cutting steel wire, the cutting effect is inferior to the laser cutting, the energy can be effectively saved compared with the laser cutting, compared with the traditional grinding wheel blade cutting, the cutting precision is high, the cutting steel wire needs to be required in the production process, after the raw material surface is processed, the wire drawing, heat treatment and electroplating protection treatment are carried out, the treatment effect of most cutting steel wire surface treatment devices is poor, before the steel wire surface is processed, the steel wire is pretreated and derusted in a mechanical mode, and because the cutting steel wire needs to be processed after the surface treatment, the subsequent wire drawing and processing is convenient, but because the cutting steel wire after being rolled is heavy, the manual handling is troublesome, and the surface treatment device for the cutting wire for the semiconductor wafer is required to solve the above problems.

Disclosure of Invention

The invention aims to provide a surface treatment device for a cutting steel wire for a semiconductor wafer, which solves the problems that most of the surface treatment devices for the cutting steel wire in the background technology have poor treatment effect, rust removal is not performed through mechanical pretreatment before the surface treatment of the steel wire, the surface treatment of the cutting steel wire needs to be rolled, the subsequent wire drawing processing is convenient, but the rolled cutting steel wire is heavy, and the manual transportation is troublesome.

In order to achieve the purpose, the invention provides the following technical scheme: a surface treatment device for a cutting steel wire for a semiconductor wafer comprises a device body, a hot air fan, a fixing frame, a support plate, a collection box and a third hydraulic telescopic rod,

the brush roll is rotatably connected to the inner portion of the device body close to the left side, the upper end of the brush roll penetrates through the device body and is connected with the first rotating shafts, the left first rotating shafts and the right first rotating shafts are connected through a toothed belt, the front first rotating shaft and the rear first rotating shaft on the right side are connected through a first gear in a meshed mode, the first gear penetrates through the first rotating shafts, and the first rotating shafts on the right rear side are connected with a first motor;

the hot air fan is arranged on the inner wall of the device body, the right side of the device body is provided with the sorting frame, the right side of the sorting frame is provided with a support frame, the inner wall of the support frame is rotatably connected with a first lead screw, the rear end of the first lead screw penetrates through the support frame to be connected with a second rotating shaft, the second rotating shaft is connected with a second motor through a bevel gear set, and meanwhile, the second motor is arranged on the rear side of the support frame;

the mount runs through the setting on first lead screw, and runs through on the mount and be provided with the card axle, and the inner block of card axle is connected with the wind-up roll simultaneously, the rear side the card axle is connected with the third pivot through the second gear, and the second gear runs through respectively to set up on the card axle of third pivot and rear side, the third pivot is connected with the third motor, and the third motor runs through the setting on the mount of rear side.

Preferably, the device body comprises a cleaning cavity, a pickling cavity, a heating cavity, a first filter screen layer, a second filter screen layer, a cleaning roller, a guide roller, a first spray pipe, a second spray pipe and a wiping roller, the cleaning cavity, the pickling cavity and the heating cavity are arranged in the device body, the cleaning cavity is arranged on the left side of the pickling cavity, the pickling cavity is arranged on the left side of the heating cavity, the heating cavity is arranged on the left side of a hot air fan, the inner wall of the heating cavity is rotatably connected with the cleaning roller, the inner wall of the cleaning cavity is provided with the first filter screen layer, a first infusion pump is arranged in the cleaning cavity and is connected with the first spray pipe, the inner wall of the pickling cavity is provided with the second filter screen layer, a second infusion pump is arranged in the pickling cavity and is connected with the second spray pipe, the guide roller is rotatably connected to the inner wall of the device body, and the wiping roller is rotatably connected to the top end of the device body, the cleaning device is characterized in that the number of the cleaning rollers is two, two cleaning rollers are arranged in each group, and each group of the cleaning rollers corresponds to the cleaning cavity and the pickling cavity respectively.

Through adopting above-mentioned technical scheme, can wash raw and other materials preliminary through first transfer pump, first spray tube, to raw and other materials surface pickling under second transfer pump, second spray tube effect.

Preferably, the brush rolls, the first rotating shaft, the toothed belt, the first gear and the first motor form a rotating mechanism, two groups of the brush rolls are arranged, and meanwhile the two groups of the brush rolls are symmetrically arranged relative to the central line of the device body.

Through adopting above-mentioned technical scheme, rust cleaning is carried out through the mechanical type to the raw and other materials surface under the effect of brush roll.

Preferably, the collecting box comprises a fan and a suction pipe, the collecting box is arranged in the device body, the collecting box is arranged below the brush roller, the fan is arranged at the upper end of the collecting box and connected with the suction pipe, and one end, far away from the fan, of the suction pipe is arranged on the outer side of the brush roller.

By adopting the technical scheme, fly ash generated by rust removal is sucked into the collection box under the action of the fan and the suction pipe.

Preferably, the arrangement frame is including second lead screw, fourth motor, removal frame, spacing, supporting wheel and spacing round, and the arrangement frame lateral wall rotates and is connected with the second lead screw, the second lead screw rear end runs through the arrangement frame lateral wall and is connected with the fourth motor, and runs through on the second lead screw and be provided with the removal frame, it is provided with spacing to remove the frame upper end, and spacing lateral wall rotates and is connected with supporting wheel and spacing round, and the supporting wheel setting is between spacing round simultaneously.

Through adopting above-mentioned technical scheme, drive the second lead screw through the fourth motor and rotate for the carriage moves on the second lead screw, can drive the steel wire and remove, convenient even rolling.

Preferably, the first screw, the second rotating shaft, the bevel gear set and the second motor form a rotating mechanism, two sections of reverse threads are arranged on the first screw, and two fixing frames are symmetrically arranged on the first screw.

Through adopting above-mentioned technical scheme, the mount can be close to each other or keep away from each other on first lead screw.

Preferably, the support plates are arranged on the support frame and arranged between the fixing frames, the number of the support plates is two, and the support plates are symmetrically arranged relative to the center line of the support frame.

Through adopting above-mentioned technical scheme, the extension board can play the supporting role to frame structure.

Preferably, the upper end of the support plate is in contact with the first idler wheel, the first idler wheel is arranged at the lower end of the first hydraulic telescopic rod, the upper end of the first hydraulic telescopic rod is arranged in the frame in a penetrating mode, the lower end face of the frame is provided with a second idler wheel close to the right side, a second hydraulic telescopic rod is arranged in the frame and arranged on the right side of the first hydraulic telescopic rod, the upper end of the second hydraulic telescopic rod is connected with the top frame, the second hydraulic telescopic rod and the top frame form a telescopic mechanism, and meanwhile the second hydraulic telescopic rod is symmetrically arranged on the center line of the top frame.

Through adopting above-mentioned technical scheme, but first hydraulic telescoping rod pulling first gyro wheel is accomodate, makes things convenient for the frame to remove to the extension board on.

Preferably, the third hydraulic telescopic rod is arranged in the device body, the inner end of the third hydraulic telescopic rod is connected with the U-shaped frame, meanwhile, the inner wall of the U-shaped frame is connected with the pressing roller in a rotating mode, the third hydraulic telescopic rod and the U-shaped frame form a rotating mechanism, and the U-shaped frame is provided with two groups.

Through adopting above-mentioned technical scheme, can extrude wiping roller through the compression roller, extrude its inside liquid composition.

Compared with the prior art, the invention has the beneficial effects that: the surface treatment device for cutting steel wire for semiconductor wafer,

(1) the cutting steel wire raw material passes through the brush roll, the brush roll is driven to rotate through a gear, a toothed belt and a first rotating shaft under the action of a first motor, the cutting steel wire raw material is subjected to rust removal through the brush roll in a mechanical mode, subsequent surface treatment processing is facilitated, and in addition, flying dust generated in the rust removal process can be sucked into a collection box under the action of a fan and a suction pipe;

(2) the cutting steel wire raw material passes through the space between the limiting wheels and the upper part of the supporting wheel, the movable frame can move back and forth on the second lead screw under the action of the fourth motor and the second lead screw to drive the cutting steel wire raw material to swing back and forth, so that the cutting steel wire raw material is conveniently and uniformly wound, the supporting wheel plays a role in supporting and stabilizing the cutting steel wire raw material, the limiting wheels can play a role in limiting and fixing the cutting steel wire raw material, and the cutting steel wire raw material is prevented from being separated in the swinging process;

(3) the cutting steel wire raw materials after preliminary cleaning can be cleaned through the left wiping roller, the influence of water stains on subsequent acid cleaning is reduced, the cutting steel wire raw materials after acid cleaning can be cleaned again through the right wiping roller, subsequent cleaning is convenient, the U-shaped frame can be pushed through the third hydraulic telescopic rod, the wiping roller in the wiping process is extruded through the compression roller, liquid adsorbed in the wiping roller is extruded, and the wiping effect of the cutting steel wire raw materials is improved;

(4) the wind-up roll passes through the card axle block of both sides fixedly, drives first lead screw rotation under second motor, second bevel gear group, second pivot effect for the mount of both sides is close to each other or keeps away from each other, and the installation of making things convenient for the wind-up roll is fixed, can support fixedly to the wind-up roll through the roof-rack, makes things convenient for the last unloading of wind-up roll, through the frame, shifts the wind-up roll after the unloading.

Drawings

FIG. 1 is a schematic front sectional view of the present invention;

FIG. 2 is a schematic top sectional view of the device body of the present invention;

FIG. 3 is a schematic top view of the first gear of the present invention;

FIG. 4 is a schematic top view of the organizer of the present invention;

FIG. 5 is a schematic diagram of a right side view of the spacing frame of the present invention;

FIG. 6 is a schematic top view of the stand of the present invention;

FIG. 7 is a schematic side view of the cross-section of the left side of the frame of the present invention.

In the figure: 1. a device body, 101, a cleaning cavity, 102, a pickling cavity, 103, a heating cavity, 104, a first filter screen layer, 105, a second filter screen layer, 106, a cleaning roller, 107, a guide roller, 108, a first spray pipe, 109, a second spray pipe, 110, a wiping roller, 2, a brush roller, 3, a first rotating shaft, 4, a toothed belt, 5, a first gear, 6, a first motor, 7, a hot air fan, 8, a sorting frame, 801, a second lead screw, 802, a fourth motor, 803, a moving frame, 804, a limiting frame, 805, a supporting wheel, 806, a limiting wheel, 9, a supporting frame, 10, a first lead screw, 11, a second rotating shaft, 12, a bevel gear group, 13, a second motor, 14, a fixing frame, 15, a clamping shaft, 16, a winding roller, 17, a second gear, 18, a third rotating shaft, 19, a third motor, 20, a support plate, 21, a first telescopic rod, 22, a first hydraulic roller, 23, a vehicle frame, 24 and a second roller, 25. the device comprises a second hydraulic telescopic rod, 26, a top frame, 27, a collecting box, 2701, a fan, 2702, a suction pipe, 28, a third hydraulic telescopic rod, 29, a U-shaped frame, 30 and a press roller.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Referring to fig. 1-7, the present invention provides a technical solution: a surface treatment device for a cutting steel wire for a semiconductor wafer is disclosed, as shown in figure 1, figure 2 and figure 3, a brush roller 2 is rotatably connected in the interior of a device body 1 close to the left side, the upper end of the brush roller 2 penetrates through the device body 1 to be connected with a first rotating shaft 3, meanwhile, the left and right first rotating shafts 3 are connected through a toothed belt 4, the device body 1 comprises a cleaning cavity 101, a pickling cavity 102, a heating cavity 103, a first filter screen layer 104, a second filter screen layer 105, a cleaning roller 106, a guide roller 107, a first spray pipe 108, a second spray pipe 109 and a wiping roller 110, the cleaning cavity 101, the pickling cavity 102 and the heating cavity 103 are arranged in the device body 1, the cleaning cavity 101 is arranged at the left side of the pickling cavity 102, the pickling cavity 102 is arranged at the left side of the heating cavity 103, the heating cavity 103 is arranged at the left side of a hot air fan 7, the inner wall of the heating cavity 103 is rotatably connected with the cleaning roller 106, the inner wall of the cleaning cavity 101 is provided with the first filter screen layer 104, a first infusion pump is arranged in the cleaning cavity 101 and is connected with a first spray pipe 108, a second filter screen layer 105 is arranged on the inner wall of the pickling cavity 102, a second infusion pump is arranged in the pickling cavity 102 and is connected with a second spray pipe 109, a guide roller 107 is rotatably connected to the inner wall of the device body 1, the top end of the device body 1 is rotatably connected with two groups of wiping rollers 110, two groups of wiping rollers 110 are arranged, each group of wiping rollers 110 is respectively corresponding to the cleaning cavity 101 and the pickling cavity 102, the cut steel wire raw material after surface cleaning is dried by a hot air fan 7, the brush roller 2, the first rotating shaft 3, the toothed belt 4, the first gear 5 and the first motor 6 form a rotating mechanism, the brush rollers 2 are arranged in two groups, the two groups of brush rollers 2 are symmetrically arranged relative to the central line of the device body 1, and the first motor 6 is arranged on the central line of the device body through the first gear 5, The toothed belt 4 and the first rotating shaft 3 drive the brush roller 2 to rotate, rust removal is carried out on the cut steel wire raw material in a mechanical mode, the front and the back first rotating shafts 3 on the right side are connected in a meshed mode through the first gear 5, the first gear 5 is arranged on the first rotating shaft 3 in a penetrating mode, meanwhile, the first rotating shaft 3 on the right back side is connected with the first motor 6, the hot air fan 7 is arranged on the inner wall of the device body 1, the arrangement frame 8 is arranged on the right side of the device body 1, the arrangement frame 8 comprises a second lead screw 801, a fourth motor 802, a moving frame 803, a limiting frame 804, a supporting wheel 805 and a limiting wheel 806, the side wall of the arrangement frame 8 is connected with the second lead screw 801 in a rotating mode, the back end of the second lead screw 801 penetrates through the side wall of the arrangement frame 8 to be connected with the fourth motor 802, the second lead screw 801 is provided with the moving frame 803 in a penetrating mode, the upper end of the moving, meanwhile, the supporting wheel 805 is arranged between the limiting wheels 806, and the cutting steel wire raw material is limited and supported by the supporting wheel 805 and the limiting wheels 806, so that the cutting steel wire raw material is prevented from being separated during moving forwards and backwards.

As shown in fig. 1, 4 and 5, a support frame 9 is arranged on the right side of the sorting frame 8, a first lead screw 10 is rotatably connected to the inner wall of the support frame 9, a rotating mechanism is composed of the first lead screw 10, a second rotating shaft 11, a bevel gear group 12 and a second motor 13, two sections of reverse threads are arranged on the first lead screw 10, two fixing frames 14 are symmetrically arranged on the first lead screw 10, the first lead screw 10 is driven to rotate under the action of the second motor 13, the bevel gear group 12 and the second rotating shaft 11, and the fixing frames 14 on the first lead screw 10 are close to or far away from each other.

As shown in fig. 1 and 6, the rear end of a first lead screw 10 penetrates through a support frame 9 to be connected with a second rotating shaft 11, the second rotating shaft 11 is connected with a second motor 13 through a bevel gear set 12, the second motor 13 is arranged on the rear side of the support frame 9, a fixing frame 14 penetrates through the first lead screw 10, a clamping shaft 15 penetrates through the fixing frame 14, and the inner end of the clamping shaft 15 is connected with a winding roller 16 in a clamping manner.

As shown in fig. 1, 6 and 7, the rear clamping shaft 15 is connected to the third rotating shaft 18 through the second gear 17, the second gear 17 is respectively disposed on the third rotating shaft 18 and the rear clamping shaft 15 in a penetrating manner, the third rotating shaft 18 is connected to the third motor 19, the third motor 19 is disposed on the rear fixing frame 14 in a penetrating manner, the support plates 20 are disposed on the support frame 9, the support plates 20 are disposed between the fixing frames 14, two support plates 20 are disposed, the support plates 20 are symmetrically disposed about a center line of the support frame 9, the support plates 20 support the frame 23 to facilitate blanking of the wind-up roll 16, the upper ends of the support plates 20 are in contact with the first rollers 21, the first rollers 21 are disposed at the lower ends of the first hydraulic telescopic rods 22, the upper ends of the first hydraulic telescopic rods 22 are disposed in the frame 23 in a penetrating manner, the lower end face of the frame 23 is provided with the second rollers 24 near the right side, the second hydraulic telescopic rods 25 are disposed in the frame 23, the second hydraulic telescopic rod 25 is arranged at the right side of the first hydraulic telescopic rod 22, the upper end of the second hydraulic telescopic rod 25 is connected with the top frame 26, the second hydraulic telescopic rod 25 and the top frame 26 form a telescopic mechanism, the second hydraulic telescopic rod 25 is symmetrically arranged around the central line of the top frame 26, the frame 23 is convenient to move under the action of the first roller 21 and the second roller 24, collected cutting steel wire raw materials are transferred, the collecting box 27 comprises a fan 2701 and a suction pipe 2702, the collecting box 27 is arranged in the device body 1, the collecting box 27 is arranged below the brush roll 2, the upper end of the collecting box 27 is provided with the fan 2701, the fan 2701 is connected with the suction pipe 2702, one end of the suction pipe 2702, far away from the fan 2701, is arranged at the outer side of the brush roll 2, flying dust generated after the brush roll 2 is derusted is sucked into the collecting box 27 through the fan 2701 and the suction pipe 2702 for collection, the third hydraulic telescopic rod 28 is arranged in the device body 1, and the inner end of the third hydraulic telescopic rod 28 is connected with the U-shaped frame 29, meanwhile, the inner wall of the U-shaped frame 29 is rotatably connected with the pressing roller 30, the third hydraulic telescopic rod 28 and the U-shaped frame 29 form a rotating mechanism, two groups of U-shaped frames 29 are arranged, and the third hydraulic telescopic rod 28 pushes the U-shaped frame 29, so that the pressing roller 30 is in pressing contact with the wiping roller 110.

The working principle is as follows: when the surface treatment device for the cutting steel wire for the semiconductor wafer is used, the cutting steel wire raw material passes through the brush roll 2, between the wiping rolls 110, between the guide rolls 107, between the cleaning rolls 106 and between the limiting wheels 806 and is wound on the winding roll 16, the power is switched on, the third motor 19 drives the third rotating shaft 18 to rotate, the third rotating shaft 18 drives the clamping shaft 15 at the rear side to rotate through the second gear 17, the clamping shaft 15 at the rear side drives the winding roll 16 to rotate for winding, the first motor 6 drives the first rotating shaft 3 at the right rear side to rotate, the first rotating shaft 3 at the right side drives the first rotating shaft 3 at the right front side to rotate through the first gear 5, the first rotating shaft 3 at the right side drives the first rotating shaft 3 at the left side to rotate through the toothed belt 4, the first rotating shaft 3 drives the brush roll 2 to rotate to derust the cutting steel wire, flying dust generated by derusting is sucked into the collecting box 27 through the fan 2701 and the suction pipe 2702, the cleaning liquid cavity 101 is sprayed out through the first spray pipe Washing, the acid liquor in the pickling cavity 102 is sprayed out by the second infusion pump through the second spray pipe 109 to pickle the cutting steel wire raw material, the first filter screen layer 104 and the second filter screen layer 105 can be used by filtering the cleaning liquid and acid, the washed cutting steel wire surface can be wiped under the action of the wiping roller 110, the third hydraulic telescopic rod 28 pushes the U-shaped frame 29, the pressing roller 30 is enabled to extrude the wiping roller 110 to extrude the liquid component of the wiping roller, the cutting steel wire is washed again through the hot water in the heating cavity 103 and cleaned under the action of the cleaning roller 106 to improve the cleaning quality, the cutting steel wire is dried through the hot air fan 7, the second lead screw 801 is driven to rotate under the action of the fourth motor 802, the cutting steel wire raw material is driven by the moving frame 803 to move back and forth on the second lead screw 801, the cutting steel wire raw material is convenient to be uniformly wound, after the winding is completed, the second roller 24 is pulled up through the first hydraulic telescopic rod 22, the frame 23 is moved to the support plate 20, the second hydraulic telescopic rod 25 pushes the top frame 26 to support the take-up roll 16, the second motor 13 drives the second rotating shaft 11 to rotate through the bevel gear set 12, the second rotating shaft 11 drives the first lead screw 10 to rotate, so that the fixed frame 14 is far away from the first lead screw 10, the clamping shaft 15 and the take-up roll 16 are clamped and separated, and the rolled raw cutting steel wire is transferred through the first roller 21 and the second roller 24.

The terms "central," "longitudinal," "lateral," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in the orientation or positional relationship indicated in the drawings for simplicity of description only and are not intended to indicate or imply that the referenced devices or elements must be in a particular orientation, constructed and operative in a particular orientation, and are not to be considered limiting of the claimed invention.

Although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that various changes in the embodiments and/or modifications of the invention can be made, and equivalents and modifications of some features of the invention can be made without departing from the spirit and scope of the invention.