1. A stamp substrate, characterized by comprising a PET film (1);

a first glass layer (3) is arranged on one side surface of the PET film (1), and the PET film (1) and the first glass layer (3) are connected through a first photoresist layer (2) to form a first-side stamp substrate;

and a second glass layer (5) is arranged on the other side surface of the PET film (1), and the PET film (1) and the second glass layer (5) are connected through a second photoresist layer (4) to form a second-side stamp substrate.

2. A stamp substrate according to claim 1, wherein the first glass layer (3) and the second glass layer (5) each have a thickness in the range of 70 to 100 μm.

3. A stamp substrate according to claim 1, wherein the first photoresist layer (2) and the second photoresist layer (4) each have a thickness in the range of 5 to 10 μm.

4. A stamp substrate according to claim 1, wherein the first photoresist layer (2) and the second photoresist layer (4) are used to bond the PET film (1) and the glass layer (3) by means of UV curing.

5. A stamp substrate according to claim 1, wherein the PET film (1) has a thickness in the range of 0.25-0.5 mm.

6. A method for preparing stamp substrate, which is characterized by comprising the following steps,

step 1, placing a first glass layer (3) on a workbench, and coating a first photoresist layer (2) on the first glass layer (3);

2, stamping the PET film (1) and the first glass layer (3) after gluing by adopting a stamp stamping manufacturing process on the first glass layer (3) after gluing; curing the integral structure after stamping to form a first surface stamp substrate;

step 3, placing a second glass layer (5) on a workbench, and coating a second photoresist layer (4) on the second glass layer (5);

and 4, stamping the first surface stamp substrate in the step 2 and the second glass layer (5) after gluing by adopting a stamp stamping manufacturing process on the second glass layer (5) after gluing, and curing to form a second surface stamp substrate after stamping.

7. A method for preparing stamp substrate according to claim 6, wherein in step 1, a first photoresist layer (2) is coated on the first glass layer (3) by a spin-coating process.

8. A stamp substrate preparation method according to claim 6, wherein in step 3, a second photoresist layer (4) is coated on the second glass layer (5) by a spin-coating process.

Background

The nano-imprinting technology is a novel micro-nano processing technology. And transferring the micro-nano structure on the template to a material to be processed by the assistance of the photoresist. The technology achieves ultrahigh resolution by means of mechanical transfer, and is an important processing means in the fields of microelectronics and materials.

The nanoimprint stamp substrate in the prior art is a PET substrate film with the thickness of 0.25mm, deformation amounts in X and Y directions of PET exist in the imprinting and demolding processes, the deformation amount in the X direction is about 5 micrometers, and the deformation amount in the Y direction is about 10 micrometers, so that the sheet-to-sheet alignment is unstable in the product imprinting process, the entire surface alignment is stable, and the existing stamp substrate PET material has deformation and cannot meet the requirements of production and manufacturing. The deformation of the PET substrate stamp during embossing and demolding (shrinkage in the X direction and stretching deformation in the Y direction) is shown in FIGS. 1 to 3.

Disclosure of Invention

In order to solve the problems in the prior art, the invention provides a stamp substrate and a preparation method thereof, which can ensure the stability of the alignment of the whole nano-imprinting surface and can meet the requirement of the alignment of the whole nano-imprinting surface of +/-5 microns.

In order to achieve the purpose, the invention provides the following technical scheme:

a stamp substrate comprising a PET film;

a first glass layer is arranged on one side surface of the PET film, and the PET film and the first glass layer are connected through a first photoresist layer to form a first-side stamp substrate;

and a second glass layer is arranged on the other side surface of the PET film, and the PET film and the second glass layer are connected through a second photoresist layer to form a second side stamp substrate.

Preferably, the thickness ranges of the first glass layer and the second glass layer are both 70-100 μm.

Preferably, the thickness ranges of the first photoresist layer and the second photoresist layer are both 5-10 μm.

Preferably, the first photoresist layer and the second photoresist layer bond the PET film and the glass layer by a UV curing method.

Preferably, the thickness range of the PET film is 0.25-0.5 mm.

A method for preparing stamp substrate comprises the following processes,

step 1, placing a first glass layer on a workbench, and coating a first photoresist layer on the first glass layer;

2, stamping the PET film and the first glass layer after gluing by adopting a stamp stamping manufacturing process on the first glass layer after gluing; curing the integral structure after stamping to form a first surface stamp substrate;

step 3, placing the second glass layer on a workbench, and coating a second photoresist layer on the second glass layer;

and 4, stamping the first surface stamp substrate and the second glass layer after gluing in the step 2 by adopting a stamp stamping manufacturing process on the second glass layer after gluing, and curing to form a second surface stamp substrate after stamping.

Preferably, in step 1, a first photoresist layer is coated on the first glass layer by a spin-coating process.

Preferably, in step 3, a second photoresist layer is coated on the second glass layer by using a spin-coating process.

Compared with the prior art, the invention has the following beneficial technical effects:

the invention provides a stamp substrate, which is characterized in that a PET (polyethylene terephthalate) film is transferred to a glass substrate, and glass layers are connected to two sides of the PET film through photoresist layers, so that the PET film is pulled and the glass cannot deform obviously in the demolding process after imprinting, the stamp film cannot deform to ensure alignment, and the first glass layer can ensure that the pressure surface of the PET film is changed into the glass in the rolling process, so that the deformation of the stamp substrate in the rolling process is reduced; the second glass layer can reduce the deformation that stamp basement produced in impression and the drawing of patterns process simultaneously, and both combined actions reduce stamp basement deformation, guarantee the stability of impression and drawing of patterns process pattern, guarantee the stability between piece and the piece, guarantee the counterpoint effect.

The invention provides a preparation method of a stamp substrate, which has simple process flow, and is characterized in that a first surface stamp substrate is formed by stamping a first photoresist layer of a first photoresist layer on a first glass layer, a second photoresist layer is coated on a second glass layer, the first surface stamp substrate and the second photoresist layer coated with glue are stamped, and the stamping and the curing are carried out to form a second surface stamp substrate. Generating OKstm substrate for stamp making; low processing cost and high economic benefit.

Drawings

FIG. 1 is a schematic illustration of a stamp substrate product embossing process;

FIG. 2 is a schematic illustration of a stamp substrate product demolding process;

FIG. 3 is a schematic diagram of deformation of stamp substrate in X and Y directions;

FIG. 4 is a schematic structural diagram of a stamp substrate according to the present invention;

in the drawings: 1 is a PET film; 2 is a first photoresist layer; 3 is a first glass layer; 4 is a second photoresist layer; and 5 is a second glass layer.

Detailed Description

The present invention will now be described in further detail with reference to specific examples, which are intended to be illustrative, but not limiting, of the invention.

As shown in fig. 4, the stamp substrate of the present invention includes a PET film 1, a first photoresist layer 2, a first glass layer 3, a second photoresist layer 4 and a second glass layer 5, wherein the first glass layer 3 is disposed on one side surface of the PET film 1, and the PET film 1 and the first glass layer 3 are connected through the first photoresist layer 2 to form a first stamp substrate; the other side surface of the PET film 1 is provided with a second glass layer 5, and the PET film 1 and the second glass layer 5 are connected through a second photoresist layer 4 to form a second face stamp substrate.

The first glass layer 3 ensures that a pressure surface of a PET film is changed into glass in the rolling and printing process, so that the deformation of the stamp substrate in the rolling process is reduced; the second glass layer 5 can reduce the deformation of the stamp substrate in the processes of stamping and demolding; the two act together to reduce stamp substrate deformation, ensure the stability of patterns in the imprinting and demolding process, ensure the stability between sheets and ensure the alignment effect.

The thickness ranges of the first glass layer 3 and the second glass layer 5 are both 70-100 mu m, and the thickness of the first glass layer 3 is the same as that of the second glass layer 5.

The thickness ranges of the first photoresist layer 2 and the second photoresist layer 4 are both 5-10 mu m. The first photoresist layer 2 and the second photoresist layer 4 have the same thickness; the first photoresist layer 2 is used for bonding the PET film 1 and the first glass layer 3 in a UV curing manner; the second photoresist layer 4 is used to bond the PET film 1 and the second glass layer 5 by a UV curing method. The thickness of the PET film 1 is about 0.25 to 0.5 mm.

The invention relates to a preparation method of a stamp substrate, which comprises the following steps,

step 1, placing a first glass layer 3 on a workbench, coating a first photoresist layer 2 on the first glass layer 3, and coating the first photoresist layer 2 by adopting a spin-coating processing mode.

And 2, stamping the PET film 1 and the first glass layer 3 after gluing by adopting a stamp stamping manufacturing process on the first glass layer 3 after gluing.

And 3, carrying out UV curing on the integral structure after stamping to form a first-side stamp substrate.

And 4, placing the second glass layer 5 on a workbench, coating the second photoresist layer 4 on the second glass layer 5, and coating the second photoresist layer 4 by adopting a spin-coating processing mode.

And 5, stamping the first surface stamp substrate and the second glass layer 5 after gluing by adopting a stamp stamping manufacturing process on the second glass layer 5 after gluing, and carrying out UV curing after stamping to form a second surface stamp substrate.

And 6, completing the above actions to generate an OKstm substrate which can be used for stamp manufacture.