Production process of hydrochloric acid for integrated circuit
1. A production process of hydrochloric acid for integrated circuits is characterized by comprising the following steps:
(1) adding industrial hydrochloric acid into a membrane filtration tower for membrane filtration treatment to obtain membrane filtrate;
(2) the obtained membrane filtrate enters an anion exchange resin tower for exchange treatment to obtain an exchange solution;
(3) then the exchange liquid enters a nitrogen gas discharge tower for discharge treatment, and nitrogen gas is continuously introduced into the bottom of the nitrogen gas discharge tower for continuous treatment for 1-2 hours to obtain nitrogen gas discharge liquid;
(4) then the nitrogen gas discharge liquid enters an evaporation tower, and is heated for evaporation treatment to obtain hot steam;
(5) and (4) condensing the hot steam in a condensing tower to obtain purified hydrochloric acid.
2. The production process of hydrochloric acid for integrated circuits according to claim 1, characterized in that the membrane filtration treatment is: the industrial hydrochloric acid is pressurized, the industrial hydrochloric acid flows along the surface of the filtering membrane, and the part which does not pass through the filtering membrane returns to the original liquid for the next filtering.
3. The process according to claim 2, wherein the pressurization pressure is 1.2 to 1.5 MPa.
4. The process according to claim 1, wherein the nitrogen used in the nitrogen purge treatment contains 10 to 15 mass% of water vapor;
when the nitrogen gas discharge treatment is performed, the exchange liquid is irradiated with ultraviolet rays and stirred at a rotation speed of 50r/min for 1 to 1.5 hours.
5. The process according to claim 1, wherein the heat treatment is divided into three heat treatments.
6. The process according to claim 5, wherein the three heat treatments are respectively: initial heating, secondary heating and tertiary heating;
the initial heating temperature is 40-50 deg.C, and the heating time is 10 min;
the secondary heating temperature is 60-75 deg.C, and the heating time is 30 min;
the third heating temperature is 100 ℃, and the heating time is 2-3 hours;
wherein, the initial heating and the secondary heating adopt the external temperature transmission for heating;
the third heating is carried out by continuously introducing 100 ℃ water vapor from the bottom of the nitrogen discharge liquid.
7. The process according to claim 6, wherein the heat-conducting medium for transferring and heating the external temperature is graphite.
8. The process of claim 1, wherein the anion exchange resin is pretreated by:
firstly, washing anion exchange resin with deionized water to remove impurities, and then naturally draining;
soaking and cleaning the anion exchange resin for 40-50min by adopting an ethanol solution, then washing with water, and naturally draining;
and soaking the anion exchange resin for 20-25 hours by using deionized water, then taking out, and naturally draining to obtain the anion exchange resin.
9. The process according to claim 8, wherein the ethanol solution is 85% by weight.
10. The process of claim 8, wherein the soaking temperature of the soaking treatment is 50-55 ℃.
Background
An integrated circuit (integrated circuit) is a type of microelectronic device or component. The transistor, the resistor, the capacitor, the inductor and other elements and wires required in a circuit are interconnected together by adopting a certain process, are manufactured on a small or a plurality of small semiconductor wafers or medium substrates, and are then packaged in a tube shell to form a micro structure with the required circuit function; all the elements are structurally integrated, so that the electronic elements are greatly miniaturized, low in power consumption, intelligent and high in reliability. It is denoted by the letter "IC" in the circuit. The integrated circuit inventors are the Jack-Kerr ratio (germanium (Ge) -based integrated circuits) and the Robert-Noisy (silicon (Si) -based integrated circuits). Most applications in the semiconductor industry today are silicon-based integrated circuits.
An integrated circuit is a new type of semiconductor device developed in the late 50 s to 60 s of the 20 th century. It is made up through such technological steps as oxidation, photoetching, diffusion, epitaxy and aluminium evaporation, and integrates the semiconductor, resistor and capacitor elements and connecting wires between them, which are all needed by a circuit with certain functions, on a small silicon chip, and then welding the electronic devices in a tube. The packaging shell has various forms such as round shell type, flat type or dual in-line type. The integrated circuit technology includes chip manufacturing technology and design technology, and is mainly embodied in capabilities of processing equipment, processing technology, packaging test, batch production and design innovation.
Hydrochloric acid is currently used in the production of semiconductor components, assembly of very large scale integrated circuits, and cleaning and etching during processing. In recent years, as the size of integrated circuits is miniaturized and the processing speed is increased, more severe requirements are made on the purity of hydrochloric acid, and the hydrochloric acid produced by the existing process cannot meet the market demands.
Disclosure of Invention
Aiming at the defects in the prior art, the invention aims to provide a production process of hydrochloric acid for an integrated circuit, which has the advantage of higher purity.
The invention provides a production process of hydrochloric acid for an integrated circuit, which has the advantage of higher purity.
In order to achieve the purpose, the invention provides the following technical scheme:
a production process of hydrochloric acid for integrated circuits comprises the following steps:
(1) adding industrial hydrochloric acid into a membrane filtration tower for membrane filtration treatment to obtain membrane filtrate;
(2) the obtained membrane filtrate enters an anion exchange resin tower for exchange treatment to obtain an exchange solution;
(3) then the exchange liquid enters a nitrogen gas discharge tower for discharge treatment, and nitrogen gas is continuously introduced into the bottom of the nitrogen gas discharge tower for continuous treatment for 1-2 hours to obtain nitrogen gas discharge liquid;
(4) then the nitrogen gas discharge liquid enters an evaporation tower, and is heated for evaporation treatment to obtain hot steam;
(5) and (4) condensing the hot steam in a condensing tower to obtain purified hydrochloric acid.
More preferably, the membrane filtration treatment is: the industrial hydrochloric acid is pressurized, the industrial hydrochloric acid flows along the surface of the filtering membrane, and the part which does not pass through the filtering membrane returns to the original liquid for the next filtering.
More preferably, the pressurization pressure is 1.2 to 1.5 MPa.
More preferably, the nitrogen gas used in the nitrogen gas discharge treatment contains 10 to 15 mass% of water vapor;
when the nitrogen gas discharge treatment is performed, the exchange liquid is irradiated with ultraviolet rays and stirred at a rotation speed of 50r/min for 1 to 1.5 hours.
More preferably, the heat treatment is divided into three heat treatments.
More preferably, the three heat treatments are respectively: initial heating, secondary heating and tertiary heating;
the initial heating temperature is 40-50 deg.C, and the heating time is 10 min;
the secondary heating temperature is 60-75 deg.C, and the heating time is 30 min;
the third heating temperature is 100 ℃, and the heating time is 2-3 hours;
wherein, the initial heating and the secondary heating adopt the external temperature transmission for heating;
the third heating is carried out by continuously introducing 100 ℃ water vapor from the bottom of the nitrogen discharge liquid.
Further preferably, the heat conducting medium for heating by external temperature transmission is graphite.
Further preferably, the anion exchange resin is pretreated by:
firstly, washing anion exchange resin with deionized water to remove impurities, and then naturally draining;
soaking and cleaning the anion exchange resin for 40-50min by adopting an ethanol solution, then washing with water, and naturally draining;
and soaking the anion exchange resin for 20-25 hours by using deionized water, then taking out, and naturally draining to obtain the anion exchange resin.
More preferably, the ethanol solution is 85% by mass.
More preferably, the soaking temperature of the soaking treatment is 50-55 ℃.
In summary, compared with the prior art, the invention has the following beneficial effects:
the invention optimizes the industrial hydrochloric acid production process, greatly improves the purity of the treated hydrochloric acid and reduces the impurity content in the hydrochloric acid through the synergistic effect of all the treatment steps, thereby better meeting the requirements in the integrated circuit process.
The purified hydrochloric acid obtained by the process has high purity, can easily meet the purity requirement of 1PPb hydrochloric acid, and is suitable for various industrial requirements.
According to the invention, through the pretreatment of the anion exchange resin, the anion exchange resin can be fully filtered to remove impurities, and the purity of the anion exchange resin is improved, so that new impurities are prevented from being introduced during ion exchange, the purity requirement of the treated hydrochloric acid is indirectly guaranteed, and meanwhile, the anion exchange resin is fully swelled, and the ion activity is fully excited, so that the ion exchange resin can be more fully used for ion exchange, the adsorption capacity of the anion exchange resin on metal ions in the industrial hydrochloric acid is greatly improved, and the metal impurities in the industrial hydrochloric acid are remarkably reduced.
Detailed Description
The present invention will be described in detail with reference to examples.
A production process of hydrochloric acid for integrated circuits comprises the following steps:
(1) adding industrial hydrochloric acid into a membrane filtration tower for membrane filtration treatment to obtain membrane filtrate;
(2) the obtained membrane filtrate enters an anion exchange resin tower for exchange treatment to obtain an exchange solution;
(3) then the exchange liquid enters a nitrogen gas discharge tower for discharge treatment, and nitrogen gas is continuously introduced into the bottom of the nitrogen gas discharge tower for continuous treatment for 1-2 hours to obtain nitrogen gas discharge liquid;
(4) then the nitrogen gas discharge liquid enters an evaporation tower, and is heated for evaporation treatment to obtain hot steam;
(5) and (4) condensing the hot steam in a condensing tower to obtain purified hydrochloric acid.
More preferably, the membrane filtration treatment is: the industrial hydrochloric acid is pressurized, the industrial hydrochloric acid flows along the surface of the filtering membrane, and the part which does not pass through the filtering membrane returns to the original liquid for the next filtering.
More preferably, the pressurization pressure is 1.2 to 1.5 MPa.
More preferably, the nitrogen gas used in the nitrogen gas discharge treatment contains 10 to 15 mass% of water vapor;
when the nitrogen gas discharge treatment is performed, the exchange liquid is irradiated with ultraviolet rays and stirred at a rotation speed of 50r/min for 1 to 1.5 hours.
More preferably, the heat treatment is divided into three heat treatments.
More preferably, the three heat treatments are respectively: initial heating, secondary heating and tertiary heating;
the initial heating temperature is 40-50 deg.C, and the heating time is 10 min;
the secondary heating temperature is 60-75 deg.C, and the heating time is 30 min;
the third heating temperature is 100 ℃, and the heating time is 2-3 hours;
wherein, the initial heating and the secondary heating adopt the external temperature transmission for heating;
the third heating is carried out by continuously introducing 100 ℃ water vapor from the bottom of the nitrogen discharge liquid.
Further preferably, the heat conducting medium for heating by external temperature transmission is graphite.
Further preferably, the anion exchange resin is pretreated by:
firstly, washing anion exchange resin with deionized water to remove impurities, and then naturally draining;
soaking and cleaning the anion exchange resin for 40-50min by adopting an ethanol solution, then washing with water, and naturally draining;
and soaking the anion exchange resin for 20-25 hours by using deionized water, then taking out, and naturally draining to obtain the anion exchange resin.
More preferably, the ethanol solution is 85% by mass.
More preferably, the soaking temperature of the soaking treatment is 50-55 ℃.
To further illustrate the present invention, the following specific examples are set forth.
Example 1:
a production process of hydrochloric acid for integrated circuits comprises the following steps:
(1) adding industrial hydrochloric acid into a membrane filtration tower for membrane filtration treatment to obtain membrane filtrate;
(2) the obtained membrane filtrate enters an anion exchange resin tower for exchange treatment to obtain an exchange solution;
(3) then the exchange liquid enters a nitrogen gas discharge tower for discharge treatment, and nitrogen gas is continuously introduced into the bottom of the nitrogen gas discharge tower for continuous treatment for 1 hour to obtain nitrogen gas discharge liquid;
(4) then the nitrogen gas discharge liquid enters an evaporation tower, and is heated for evaporation treatment to obtain hot steam;
(5) and (4) condensing the hot steam in a condensing tower to obtain purified hydrochloric acid.
The membrane filtration treatment comprises the following steps: the industrial hydrochloric acid is pressurized, the industrial hydrochloric acid flows along the surface of the filtering membrane, and the part which does not pass through the filtering membrane returns to the original liquid for the next filtering.
The pressurization pressure was 1.2 MPa.
The nitrogen gas used in the nitrogen gas discharge treatment contains 10 mass% of water vapor;
when the nitrogen gas discharge treatment was performed, the exchange liquid was further irradiated with ultraviolet rays and stirred at a rotation speed of 50r/min for 1 hour.
The heat treatment is divided into three heat treatments.
The three times of heating treatment are respectively as follows: initial heating, secondary heating and tertiary heating;
the initial heating temperature is 40 ℃, and the heating time is 10 min;
the secondary heating temperature is 60 ℃, and the heating time is 30 min;
the third heating temperature is 100 ℃, and the heating time is 2 hours;
wherein, the initial heating and the secondary heating adopt the external temperature transmission for heating;
the third heating is carried out by continuously introducing 100 ℃ water vapor from the bottom of the nitrogen discharge liquid.
The heat conducting medium for heating in the external temperature transmission is graphite.
The anion exchange resin is pretreated:
firstly, washing anion exchange resin with deionized water to remove impurities, and then naturally draining;
soaking and cleaning the anion exchange resin for 40min by adopting an ethanol solution, then washing with water, and naturally draining;
and soaking the anion exchange resin for 20 hours by using deionized water, then taking out, and naturally draining to obtain the anion exchange resin.
The mass fraction of the ethanol solution is 85 percent.
The soaking temperature of the soaking treatment is 50 ℃.
Example 2
A production process of hydrochloric acid for integrated circuits comprises the following steps:
(1) adding industrial hydrochloric acid into a membrane filtration tower for membrane filtration treatment to obtain membrane filtrate;
(2) the obtained membrane filtrate enters an anion exchange resin tower for exchange treatment to obtain an exchange solution;
(3) then the exchange liquid enters a nitrogen gas discharge tower for discharge treatment, and nitrogen gas is continuously introduced into the bottom of the nitrogen gas discharge tower for continuous treatment for 2 hours to obtain nitrogen gas discharge liquid;
(4) then the nitrogen gas discharge liquid enters an evaporation tower, and is heated for evaporation treatment to obtain hot steam;
(5) and (4) condensing the hot steam in a condensing tower to obtain purified hydrochloric acid.
The membrane filtration treatment comprises the following steps: the industrial hydrochloric acid is pressurized, the industrial hydrochloric acid flows along the surface of the filtering membrane, and the part which does not pass through the filtering membrane returns to the original liquid for the next filtering.
The pressure was 1.5 MPa.
The nitrogen gas adopted in the nitrogen gas discharge treatment contains 15 mass percent of water vapor;
when the nitrogen gas discharge treatment was performed, the exchange liquid was further irradiated with ultraviolet rays and stirred at a rotation speed of 50r/min for 1.5 hours.
More preferably, the heat treatment is divided into three heat treatments.
More preferably, the three heat treatments are respectively: initial heating, secondary heating and tertiary heating;
the initial heating temperature is 50 ℃, and the heating time is 10 min;
the secondary heating temperature is 75 ℃, and the heating time is 30 min;
the third heating temperature is 100 ℃, and the heating time is 3 hours;
wherein, the initial heating and the secondary heating adopt the external temperature transmission for heating;
the third heating is carried out by continuously introducing 100 ℃ water vapor from the bottom of the nitrogen discharge liquid.
The heat conducting medium for heating in the external temperature transmission is graphite.
The anion exchange resin is pretreated:
firstly, washing anion exchange resin with deionized water to remove impurities, and then naturally draining;
soaking and cleaning the anion exchange resin for 50min by adopting an ethanol solution, then washing with water, and naturally draining;
and soaking the anion exchange resin for 25 hours by using deionized water, then taking out, and naturally draining.
The mass fraction of the ethanol solution is 85 percent.
The soaking temperature of the soaking treatment was 55 ℃.
Example 3
A production process of hydrochloric acid for integrated circuits comprises the following steps:
(1) adding industrial hydrochloric acid into a membrane filtration tower for membrane filtration treatment to obtain membrane filtrate;
(2) the obtained membrane filtrate enters an anion exchange resin tower for exchange treatment to obtain an exchange solution;
(3) then the exchange liquid enters a nitrogen gas discharge tower for discharge treatment, and nitrogen gas is continuously introduced into the bottom of the nitrogen gas discharge tower for continuous treatment for 1.2 hours to obtain nitrogen gas discharge liquid;
(4) then the nitrogen gas discharge liquid enters an evaporation tower, and is heated for evaporation treatment to obtain hot steam;
(5) and (4) condensing the hot steam in a condensing tower to obtain purified hydrochloric acid.
The membrane filtration treatment comprises the following steps: the industrial hydrochloric acid is pressurized, the industrial hydrochloric acid flows along the surface of the filtering membrane, and the part which does not pass through the filtering membrane returns to the original liquid for the next filtering.
The pressurization pressure was 1.28 MPa.
The nitrogen gas used in the nitrogen gas discharge treatment contains 12 mass% of water vapor;
when the nitrogen gas discharge treatment was performed, the exchange liquid was further irradiated with ultraviolet rays and stirred at a rotation speed of 50r/min for 1.1 hours.
The heat treatment is divided into three heat treatments.
The three heating treatments are respectively as follows: initial heating, secondary heating and tertiary heating;
the initial heating temperature is 45 ℃, and the heating time is 10 min;
the secondary heating temperature is 62 ℃, and the heating time is 30 min;
the third heating temperature is 100 ℃, and the heating time is 2.5 hours;
wherein, the initial heating and the secondary heating adopt the external temperature transmission for heating;
the third heating was carried out by continuously introducing 100 ℃ steam from the bottom of the nitrogen-discharged liquid.
The heat conducting medium for heating in the external temperature transmission is graphite.
The anion exchange resin is pretreated:
firstly, washing anion exchange resin with deionized water to remove impurities, and then naturally draining;
soaking and cleaning the anion exchange resin for 45min by adopting an ethanol solution, then washing with water, and naturally draining;
and soaking the anion exchange resin for 22 hours by using deionized water, then taking out, and naturally draining to obtain the anion exchange resin.
The mass fraction of the ethanol solution is 85 percent.
The soaking temperature of the soaking treatment was 52 ℃.
Example 4:
a production process of hydrochloric acid for integrated circuits comprises the following steps:
(1) adding industrial hydrochloric acid into a membrane filtration tower for membrane filtration treatment to obtain membrane filtrate;
(2) the obtained membrane filtrate enters an anion exchange resin tower for exchange treatment to obtain an exchange solution;
(3) then the exchange liquid enters a nitrogen gas discharge tower for discharge treatment, and nitrogen gas is continuously introduced into the bottom of the nitrogen gas discharge tower for continuous treatment for 1.8 hours to obtain nitrogen gas discharge liquid;
(4) then the nitrogen gas discharge liquid enters an evaporation tower, and is heated for evaporation treatment to obtain hot steam;
(5) and (4) condensing the hot steam in a condensing tower to obtain purified hydrochloric acid.
The membrane filtration treatment comprises the following steps: the industrial hydrochloric acid is pressurized, the industrial hydrochloric acid flows along the surface of the filtering membrane, and the part which does not pass through the filtering membrane returns to the original liquid for the next filtering.
The pressure was 1.4 MPa.
The nitrogen gas used in the nitrogen gas discharge treatment contained 14 mass% of water vapor;
when the nitrogen gas discharge treatment was performed, the exchange liquid was further irradiated with ultraviolet rays and stirred at a rotation speed of 50r/min for 1.3 hours.
The heat treatment is divided into three heat treatments.
The three times of heating treatment are respectively as follows: initial heating, secondary heating and tertiary heating;
the initial heating temperature is 47 ℃, and the heating time is 10 min;
the secondary heating temperature is 66 ℃, and the heating time is 30 min;
the third heating temperature is 100 ℃, and the heating time is 2.8 hours;
wherein, the initial heating and the secondary heating adopt the external temperature transmission for heating;
the third heating is carried out by continuously introducing 100 ℃ water vapor from the bottom of the nitrogen discharge liquid.
The heat conducting medium for heating in the external temperature transmission is graphite.
The anion exchange resin is pretreated:
firstly, washing anion exchange resin with deionized water to remove impurities, and then naturally draining;
soaking and cleaning the anion exchange resin for 42min by adopting an ethanol solution, then washing with water, and naturally draining;
and soaking the anion exchange resin for 24 hours by using deionized water, then taking out, and naturally draining.
The mass fraction of the ethanol solution is 85 percent.
The soaking temperature of the soaking treatment was 53 ℃.
Example 5
A production process of hydrochloric acid for integrated circuits comprises the following steps:
(1) adding industrial hydrochloric acid into a membrane filtration tower for membrane filtration treatment to obtain membrane filtrate;
(2) the obtained membrane filtrate enters an anion exchange resin tower for exchange treatment to obtain an exchange solution;
(3) then the exchange liquid enters a nitrogen gas discharge tower for discharge treatment, and nitrogen gas is continuously introduced into the bottom of the nitrogen gas discharge tower for continuous treatment for 1.8 hours to obtain nitrogen gas discharge liquid;
(4) then the nitrogen gas discharge liquid enters an evaporation tower, and is heated for evaporation treatment to obtain hot steam;
(5) and (4) condensing the hot steam in a condensing tower to obtain purified hydrochloric acid.
The membrane filtration treatment comprises the following steps: the industrial hydrochloric acid is pressurized, the industrial hydrochloric acid flows along the surface of the filtering membrane, and the part which does not pass through the filtering membrane returns to the original liquid for the next filtering.
The pressurization pressure is 1.5 MPa.
The nitrogen gas adopted in the nitrogen gas discharge treatment contains 10 mass percent of water vapor;
when the nitrogen gas discharge treatment is performed, the exchange liquid is irradiated with ultraviolet rays and stirred at a rotation speed of 50r/min for 1 to 1.5 hours.
The heat treatment is divided into three heat treatments.
The three times of heating treatment are respectively as follows: initial heating, secondary heating and tertiary heating;
the initial heating temperature is 50 ℃, and the heating time is 10 min;
the secondary heating temperature is 65 ℃, and the heating time is 30 min;
the third heating temperature is 100 ℃, and the heating time is 3 hours;
wherein, the initial heating and the secondary heating adopt the external temperature transmission for heating;
the third heating is carried out by continuously introducing 100 ℃ water vapor from the bottom of the nitrogen discharge liquid.
The heat conducting medium for heating in the external temperature transmission is graphite.
The anion exchange resin is pretreated:
firstly, washing anion exchange resin with deionized water to remove impurities, and then naturally draining;
soaking and cleaning the anion exchange resin for 40min by adopting an ethanol solution, then washing with water, and naturally draining;
and soaking the anion exchange resin for 20-25 hours by using deionized water, then taking out, and naturally draining to obtain the anion exchange resin.
The mass fraction of the ethanol solution is 85 percent.
The soaking temperature of the soaking treatment was 55 ℃.
Comparative example 1:
a process for producing hydrochloric acid for integrated circuits, which is different from example 1 in that no anion resin column exchange treatment is performed.
Comparative example 2:
a process for producing hydrochloric acid for integrated circuits, which is different from example 1 in that no nitrogen purging treatment was performed.
Comparative example 3: a process for producing hydrochloric acid for integrated circuits, which is different from example 1 in that evaporation treatment is not performed.
Test of
The industrial hydrochloric acid adopts 31 percent of national standard reagent grade hydrochloric acid for testing;
TABLE 1
(HCl) content%
Example 1
38.5
Example 2
38.8
Example 3
38.2
Example 4
38.5
Example 5
38.1
Comparative example 1
35.2
Comparative example 2
37.2
Comparative example 3
34.6
As can be seen from Table 1, the content of the purified hydrochloric acid produced by the method of the invention is obviously improved, and the comparative example 1 shows that the content of the hydrogen chloride can be further improved by adopting the exchange treatment of the anion resin after pretreatment, because the exchange efficiency of the anion resin after pretreatment is obviously improved, the impurities in the industrial hydrochloric acid can be more efficiently removed, the content of the hydrogen chloride which is not subjected to the exchange treatment of the anion resin is only 35.2 percent, while the content of the hydrogen chloride which is obtained by the process of the embodiment 1 of the invention is up to 38.5 percent, therefore, the exchange treatment of the anion resin adopted in the invention achieves the obvious improvement effect, and by carrying out the nitrogen discharge treatment, the nitrogen enters from the bottom of the exchange solution and moves upwards to discharge the exchange solution, and in the process, the dissolved chlorine in the exchange solution can be taken away, the influence of the hydrogen chloride on the industrial hydrochloric acid is reduced, and the improvement of the purity of the hydrogen chloride can be further promoted by performing evaporation treatment.
TABLE 2
Chroma (APHA)
Example 1
8
Example 2
8
Example 3
8
Example 4
8
Example 5
8
Comparative example 1
15
Comparison ofExample 2
10
Comparative example 3
12
As can be seen from table 2, the chroma of the purified hydrochloric acid obtained by the process of the present invention is significantly reduced, which indicates that the removal rate of impurities in the raw industrial hydrochloric acid is high, and the purity of the purified hydrochloric acid is greatly improved, and it can be seen that the reduction of chroma is mainly achieved by the exchange treatment of the anion exchange resin, and a large amount of metal ions are the main objects for improving the chroma of the industrial hydrochloric acid, so that more metal ions can be removed by the exchange treatment of the anion exchange resin, thereby significantly reducing chroma, and compared with hydrochloric acid which is not treated by the anion exchange resin, the chroma of the process of the present invention is reduced by 46.67%, and the effect is significant.
TABLE 3
Metallic impurities (ppb or less)
Example 1
Conform to
Example 2
Conform to
Example 3
Conform to
Example 4
Conform to
Example 5
Conform to
Comparative example 1
Is not in compliance with
Comparative example 2
Conform to
Comparative example 3
Conform to
As can be seen from Table 3, the anion exchange resin treatment in the process of the invention can greatly reduce the content of metal impurities and improve the purity of industrial hydrochloric acid, and the invention can obviously improve the exchange efficiency of the anion exchange resin by carrying out certain pretreatment on the anion exchange resin and carrying out treatments such as full swelling and purification on the anion exchange resin, thereby greatly improving the efficiency during the exchange treatment, removing more metal impurities in the hydrochloric acid and further improving the purity of the hydrochloric acid.
The embodiments of the present invention are preferred embodiments of the present invention, and the scope of the present invention is not limited by these embodiments, so: all equivalent changes made according to the structure, shape and principle of the invention are covered by the protection scope of the invention.
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